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Entegris brings technologies and competencies together in the LiquidLens™ UPW purification system to enable immersion lithography process advancements. |
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Ensuring ultrapure, consistent water quality preserves optic's life by controlling contaminants at the point of use such as dissolved gases, micro bubbles and particles. |
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Maintains maximum temperature control by incorporating the pHasor® X heat exchanger, which provides optimum heat transfer while preserving absolute fluid purity. |
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A pHasor® II membrane contactor ensures the process water is free of bubbles while maintaining absolute purity. |
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Two UV lamps break down TOC levels in the water while an ion exchange purifier removes the organics, ensuring a high purity fluid stream. |
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Incorporates a 0.02 µm filter in a Chemlock housing. The filter is ideally suited for ultra-high purity water applications and the Chemlock housing preserves space while reducing the cost of ownership. |
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Advanced process control continually monitors critical parameters, providing 48-hour rolling trend data with configurable warning and error alarms. |
